設備名稱 Equipment Name

管式等離子體淀積爐  Horizontal PECVD

設備型號 Equipment Model

PD-520

設備用途 Equipment Application

主要用于晶體硅太陽能電池制造中電池片的減反射膜生長，也可用于在電池片的背面沉積鈍化膜。
Mainly used for generates highest quality anti-refiective coatings in the production of crystal silicon solar cells, and for deposition of passivation film on the rear side of solar cells.

工藝流程 Process Flow

石墨舟及硅片準備→管內充氮氣→進舟→抽真空、壓力測試→氨氣預清理和檢查→管路抽真空、測漏、恒溫→預鍍膜→鍍膜→抽真空、壓力測試→清管路、充氮氣→退舟
Graphite boat & wafers ready→Nitrogen inlet→Graphite boat load in→Vacuumize, pressure test→Ammonia pre-clean and check→Vacuumize the tube,leak-checking , constant temperature→Pre-coating→Coating→Vacuumize,pressure test→Tube cleaning and Nitrogen inlet→Graphite boat unload

技術特點  Features

1、兼容氮氧化硅PERC技術。
Compatible with SiOxNy PERC process.

2、雙水冷密封技術。
Double cooling water flanges sealing technology.

3、專利內加熱技術。
Patented internal heating technology.

4、高速平穩整體模組推舟機構。
High-speed integral module boat pushing mechanism.

5、懸浮承載舟技術。
Graphite boat contact-free with quartz tube.

6、自主知識產權MES軟件。
MES software with independent intellectual property right.

7、自主開發中央計算機集中控制系統。
Independently developed CCC system.

8、快速鍍膜技術。
Fast coating technology.

9、全面的防超溫、斷偶、撞舟等安全報警保護功能。

Alarm protection for over-heating, thermocouple -break and boat collision. 

設備參數  Parameters