Equipment Name

Horizontal PECVD (AlOx ) 

Equipment Model

PD-520

Equipment Application

Deposit AlO_x passivition dielectric film on the rear side of wafers using N₂O and TMA gas to increase voltage and current of the solar cell and then deposit Si_xN_y protective film on the surface of the AlO_x film.

Process Flow

Graphite boat & wafers ready→ Nitrogen inlet→ graphite boat load in→ vacuumize, pressure test → deposit AlO_x film→ vacuumize, pressure test→ tube cleaning and Nitrogen inlet→ graphite boat unload.

Features

· AlO_x, SiO_xN_y and SiN_x complex layers.  

· Compatible with SiN_x and SiO_xN_y PERC process. 

· Double water-cooled sealing technology .

· Patented internal heating technology.

· High-speed integral module boat pushing mechanism.

· Graphite boat contact-free with quartz tube.

· MES software with independent intellectual property right.

· Independently developed CCC system.

· Fast coating technology.

· Alarm protection for over-heating, thermocouple -break and boat collision.

Parameters