Horizontal PECVD (poly-Si)
This equipment is mainly used for the deposition of tunnel oxide layer, intrinsic poly-si layer, poly-si layer doping and mask layer for TOPCon solar cells.
Graphite boat & wafers ready→ nitrogen inlet→ graphite boat load in→vacuumize, pressure test → multi layers deposition→vacuumize, pressure test→ Pipe purging, nitrogen inlet→ graphite boat unload
· Tunnel oxide layer, intrinsic Poly-Si, doping Poly-Si, mask layer, four processes completed in one in-situ doping.
· With in-situ clean.
· Double water-cooled sealing technology.
· Patented internal heating technology.
· High-speed integral module boat pushing mechanism.
· Graphite boat contact-free with quartz tube.
· MES software with independent intellectual property right.
· Independently developed CCC system.
· Fast coating technology.
· Alarm protection for over-heating, thermocouple-break and boat collision.