Equipment Name

Horizontal Boron Diffusion Furnace

Equipment Model

DOA-420

Equipment Application

The Equipment Is Mainly Used For Doping And Form Pn Junctions On Silicon Wafers In The Manufacturing Process Of Crystalline Silicon Solar Cells.

Process Flow

Prepare quartz boat & wafers→ Insert wafers→ Loading wafers→ Choose recipe → Boat loading→ tube Vacuuming→ Temperature rising→ Oxygen inlet→BBr3/BCL3 inlet→ Push in→ DOA treatment→ Boat unloading→ Cooling→ Testing→ Wafer unloading

Features

· High temperature boron diffusion.

· BBr3、BCL3.

· Patented technology.

· Unique double-layer-nested furnace door structure.

· Patented technology for exhaust gas treatment system.

· High-speed integral module boat pushing mechanism.

· Intelligent automatic control.

· MES software with independent intellectual property right.

· Comprehensive safety alarm protection functions such as over-temperature prevention, broken thermocouple, and boat collision.

· Compatible with S.C smart factory solution.

Parameters