Equipment Name

Mono-crystalline Batch Texturing Equipment

Equipment Model

SC-CSZ8000E-16F

Equipment Application

Used for texturing& cleaning of mono crystalline wafers.

Process Flow

Saw damage removal→Pre-cleaning→Mono-texturing→Post cleaning→Acid cleaning→Hot water drying→Drying (for reference only)

Features

· Throughput: 400pcs/batch, 8000pcs/h.

· Process bath circulation volume adjustable.

· Uniform pyramids texture, etch depth adjustable.

· Wafer thickness handling capability up to 120μm

· With clean dry area and self-clean dry system.

· H₂O₂ free.

· Quick inline bath change.

· Available with MES, RFID system, inline weight testing optional.

Parameters