Equipment Name

Batch Alkaline Polishing Equipment

Equipment Model

SC-CSZ8000E-14F

Equipment Application

This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.

Features 

· Throughput: 400pcs/batch, 8000pcs/h.

· Compatible with rear side etch polishing and mono-crystalline rear side texturing process.

· Suitable for various additives.

· Wafer thickness down to 120um.

· With dry clean area and self-cleaning system.

· Quick inline bath change.

· Available with MES, RFID system, inline weight testing optional.

Parameters